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INDIUM HYDRATE CAKE AND COPPER SULFIDE CAKE EXTRACTION METHOD FROM SPENT ACIDS OF THE ITO SPUTTERING PROCESS

机译:ITO溅射酸萃取水合蛋糕和硫化铜蛋糕的方法。

摘要

PURPOSE: A recovering method of indium hydroxide containing cake and copper sulfide containing cake from ITO(indium-tin oxide) sputtering waste acid is provided to resolve problems wherein indium is not capable of being produced from the ITO sputtering waste acid containing a high concentration of copper, and to recycle wasted copper. CONSTITUTION: A recovering method of indium hydroxide containing cake and copper sulfide containing cake from ITO(indium-tin oxide) sputtering waste acid comprises the following steps. Copper hydroxide containing slurry and low grade indium hydroxide containing slurry are dehydrated to collect the copper hydroxide containing cake and a low grade indium hydroxide containing cake(P100). The copper sulfide containing cake is collected by dehydrating the copper sulfide containing slurry which is generated in a hydrochloric acid solution by the addition of sodium hydrosulphide and sulfuric acid after the copper hydroxide containing cake and the low grade indium hydroxide containing cake is dissolved in the hydrochloric acid solution(P200). High grade indium hydroxide containing slurry is precipitated, separated, and dehydrated to collect a high grade indium hydroxide containing cake(P300). A caustic soda dose is within the range satisfying the pH 9.0-13.0, and 10-25 parts by volume of 50% caustic soda is inputted corresponding to 100 parts by volume of ITO sputtering waste acid. [Reference numerals] (P100) Step of recovering a cake containing copper hydroxide and low grade indium hydroxide; (P200) Step of recovering a cake containing copper sulfide; (P300) Step of recovering a cake containing high grade indium hydroxide;
机译:目的:提供一种从ITO(氧化铟锡)溅射废酸中回收含氢氧化铟的饼和含硫化铜的饼的方法,以解决不能从高浓度的ITO溅射废酸中生产铟的问题。铜,并回收浪费的铜。组成:从ITO(铟锡氧化物)溅射废酸中回收含氢氧化铟饼和含硫化铜饼的方法包括以下步骤。将含有氢氧化铜的浆料和含有低级氢氧化铟的浆料脱水以收集含有氢氧化铜的饼和含有低级氢氧化铟的饼(P100)。在将含有氢氧化铜的滤饼和含有低级氢氧化铟的滤饼溶解在盐酸中之后,通过添加在硫酸溶液中生成的含硫化铜的浆液进行脱水,从而收集含硫化铜的滤饼,所述浆料在盐酸溶液中产生。酸性溶液(P200)。沉淀,分离和脱水含高级氢氧化铟的浆料,以收集含高级氢氧化铟的饼(P300)。苛性钠剂量在满足pH 9.0-13.0的范围内,并且输入10-25体积份的50%的苛性钠,相当于100体积份的ITO溅射废酸。 [附图标记](P100)回收包含氢氧化铜和低级氢氧化铟的饼的步骤; (P200)回收含有硫化铜的滤饼的步骤; (P300)回收含有高级氢氧化铟的滤饼的步骤;

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