the fluorinated polymer of the present invention, the formula (2), the repeating unit (a) represented by the included, and the mass average molecular weight of 1000 to 1,000,000. The resin is, by using a high-energy radiation or electron beam having a wavelength of 300nm or less resist composition, and can be preferably used in the topcoat composition in a liquid immersion lithography to form a pattern, water-repellent, characterized in that in particular the receding contact angle greater The. [Formula 72] (Wherein, R 1 represents a polymerizable double bond-containing, R 2 represents a fluorine atom or a fluorinated alkyl group, R 8 represents a substituted or unsubstituted alkyl group, etc., W 1 and the like represents a single bond, an unsubstituted or substituted methylene group.)
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