Fabrication Method of Emitter Wrap Through Solar Cell Using Onestep Doping Process

摘要

Provided is a method of fabricating a selective EWT solar cell, including: a) forming via holes penetrating through opposing first and second surfaces of a p-type semiconductor substrate using laser; b) forming an anti-reflective film on the first surface of the semiconductor substrate, and forming a passivation film on the second surface of the semiconductor substrate; c) partially etching the passivation film so as to expose a part of the second surface on which an opening part of each of the via holes is formed; and d) heat-treating the semiconductor substrate under the presence of n-type impurity to dope the n-type impurity on the semiconductor substrate.