METHOD OF PRODUCING ISOTOPICALLY-ENRICHED GERMANIUM

摘要

FIELD: metallurgy.;SUBSTANCE: proposed method comprises plasma chemical decomposition of isotopically-enriched germanium in the mix with hydrogen in nonequilibrium plasma of HF discharge and depositing germanium on substrate. Note here that said deposition is performed outside the discharge fire zone at the pressure of 200-300 mTorr, GeF₄-to-H₂ ratio making at least 1:4 and their total flow rate of 100-150 cm³/min. Output of this method makes at least 5 g/h of polycrystalline germanium with yield of finished product making 90-95% which allows growing monocrystals of isotopically-enriched germanium of good quality in amount of, at least, several tens of grams.;EFFECT: higher efficiency and yield.;1 ex, 1 tbl