Interference lithography device for use in patterning of light exit surface of wafer for high brightness LED, has phase/blaze grating with low period length, for coherent superposition of sub-beams in image plane

摘要

The interference lithography device (1) has an illumination device (2) for providing the radiation beam (3). A phase/blaze grating (4) with high period length (P1) is arranged in downstream of the illumination device for diffracting the radiation beam into two sub-beams (3a,3b). A phase/blaze grating (9) with low period length (P2) is arranged in downstream of the grating (4), for coherent superposition of the sub-beams in an image plane (7). An independent claim is included for method for producing interference pattern by interference lithography.