首页> 外国专利> Vapor chamber radiator for use in electronic product, has capillary and supporting structures provided in cavity, where capillary structure is formed at walls of cavity and supporting structure is connected with metal and ceramic plates

Vapor chamber radiator for use in electronic product, has capillary and supporting structures provided in cavity, where capillary structure is formed at walls of cavity and supporting structure is connected with metal and ceramic plates

机译:用于电子产品的蒸气室散热器,在腔体内具有毛细管和支撑结构,在腔壁上形成有毛细管结构,支撑结构与金属板和陶瓷板连接

摘要

The radiator has a main body (1) comprising a metal plate (11) and a ceramic plate (12), which are connected with each other. The main body forms a cavity, and a capillary structure (14) and a supporting structure (15) are provided in the cavity. The capillary structure is formed at inner walls of the cavity, and the supporting structure is connected with the plates by soft soldering, braze welding, diffusion bonding, ultrasonic welding or direct bonding copper. The capillary structure is formed by sinter powder, net bodies or grooves. The supporting structure is formed by copper rods. An independent claim is also included for a vapor chamber radiator manufacturing method.
机译:散热器具有主体(1),主体(1)包括彼此连接的金属板(11)和陶瓷板(12)。主体形成空腔,并且在该空腔中提供毛细管结构(14)和支撑结构(15)。毛细管结构形成在腔的内壁处,并且支撑结构通过软钎焊,铜焊,扩散接合,超声焊接或直接接合铜与板连接。毛细结构是由烧结粉末,网状物或凹槽形成的。支撑结构由铜棒形成。蒸气室散热器的制造方法也包括独立权利要求。

著录项

  • 公开/公告号DE102011115784A1

    专利类型

  • 公开/公告日2013-04-04

    原文格式PDF

  • 申请/专利权人 ASIA VITAL COMPONENTS CO. LTD.;

    申请/专利号DE201110115784

  • 发明设计人 YANG HSIU-WEI;

    申请日2011-10-04

  • 分类号H01L23/467;H05K7/20;F28F21/04;

  • 国家 DE

  • 入库时间 2022-08-21 16:22:10

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