首页> 外国专利> Method for manufacturing substrate for power semiconductor component e.g. MOSFET for power converter, involves arranging electroplating ridges in recesses formed in bottom metallization layer of insulating material portion

Method for manufacturing substrate for power semiconductor component e.g. MOSFET for power converter, involves arranging electroplating ridges in recesses formed in bottom metallization layer of insulating material portion

机译:用于功率半导体部件例如用于功率转换器的MOSFET,涉及在绝缘材料部分的底部金属化层中形成的凹槽中布置电镀脊

摘要

The method involves providing an electrically non-conductive insulating material portion (1) and applying top and bottom metallization layers (2a,2b) on the top and bottom sides of the insulating material portion. An electrically non-conductive coating layer (3) is formed on the bottom metallization layer. Several recesses (13) are formed in the coating layer. The electroplating ridges (6) are arranged in the recesses formed in the bottom metallization layer. Independent claims are included for the following: (1) method for manufacturing power semiconductor module; (2) substrate for power semiconductor component; and (3) power semiconductor module.
机译:该方法包括提供不导电的绝缘材料部分(1),并在绝缘材料部分的顶侧和底侧上施加顶部和底部金属化层(2a,2b)。在底部金属化层上形成非导电涂层(3)。在涂层中形成几个凹槽(13)。电镀脊(6)布置在底部金属化层中形成的凹槽中。以下是独立权利要求:(1)功率半导体模块的制造方法; (2)功率半导体元件用基板; (3)功率半导体模块。

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