首页> 外国专利> Optical arrangement for e.g. extreme UV lithography, has optical element in which internal channels for transit of fluid are provided, where ends of fluid conduits are directly joined with optical element at connecting section points

Optical arrangement for e.g. extreme UV lithography, has optical element in which internal channels for transit of fluid are provided, where ends of fluid conduits are directly joined with optical element at connecting section points

机译:光学装置极紫外光刻技术,具有光学元件,该光学元件中提供了用于流体传输的内部通道,其中流体导管的末端在连接截面点处与光学元件直接连接

摘要

The arrangement (10) has an optical element (12) e.g. mirror, in which internal channels (16, 16a, 16b) for transit of fluid e.g. liquid, are provided. Ends (20a, 20b) of external fluid conduits (18a, 18b) are connected with the optical element at connecting section points (22a, 22b) such that the fluid is supplied into the channels through the fluid conduits and/or discharged from the channels. The ends of the fluid conduits are directly joined with the optical element at the connecting section points. A recess is introduced in the optical element at the connecting section points. An independent claim is also included for a method for manufacturing an optical arrangement.
机译:装置(10)具有光学元件(12),例如。镜子,其中内部通道(16、16a,16b)用于输送流体,例如提供液体。外部流体导管(18a,18b)的端部(20a,20b)在连接截面点(22a,22b)处与光学元件连接,使得流体通过流体导管被供应到通道中和/或从通道中排出。 。流体导管的末端在连接截面点处与光学元件直接连接。在光学元件的连接截面点处引入凹槽。还包括一种用于制造光学装置的方法的独立权利要求。

著录项

  • 公开/公告号DE102012219540A1

    专利类型

  • 公开/公告日2013-10-17

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT GMBH;

    申请/专利号DE201210219540

  • 发明设计人 FIGUEREDO STACY;

    申请日2012-10-25

  • 分类号G02B5/08;G03F7/20;

  • 国家 DE

  • 入库时间 2022-08-21 16:21:38

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