首页> 外国专利> SPUTTERING TARGET MATERIAL USED FOR PREPARING RECORDING LAYER OF WRITABLE OPTICAL RECORDING MEDIUM AND WRITABLE OPTICAL RECORDING MEDIUM USING THE SAME

SPUTTERING TARGET MATERIAL USED FOR PREPARING RECORDING LAYER OF WRITABLE OPTICAL RECORDING MEDIUM AND WRITABLE OPTICAL RECORDING MEDIUM USING THE SAME

机译:用于制备可写光学记录介质和可写光学记录介质的记录层的溅射靶材料

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target material used for preparing a writable optical recording medium and the writable optical recording medium using the sputtering target material.;SOLUTION: A recording layer is prepared by a magnetron sputter using an inorganic thin film material. The material is selected from a mixed film made of copper (Cu), silicon (Si), and chrome (Cr) as main components. The writable optical recording medium, upon receipt of the irradiation of laser beams, changes a microstructure formed in the recording layer, thereby achieving an object of recording data.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:提供用于制备可写光学记录介质的溅射靶材料,以及使用该溅射靶材料的可写光学记录介质。解决方案:通过使用无机薄膜材料的磁控溅射制备记录层。该材料选自由铜(Cu),硅(Si)和铬(Cr)作为主要成分的混合膜。可写光学记录介质在接收到激光束的照射后,改变形成在记录层中的微观结构,从而达到记录数据的目的。;版权所有:(C)2014,JPO&INPIT

著录项

  • 公开/公告号JP2014086124A

    专利类型

  • 公开/公告日2014-05-12

    原文格式PDF

  • 申请/专利权人 CMC MAGNETICS CORP;

    申请/专利号JP20120248948

  • 申请日2012-11-13

  • 分类号G11B7/243;G11B7/24035;G11B7/2534;G11B7/2533;G11B7/258;G11B7/254;G11B7/257;G11B7/26;C23C14/34;

  • 国家 JP

  • 入库时间 2022-08-21 16:19:55

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号