PHOTOACID GENERATING COMPOUND AND PHOTORESIST COMPOSITION COMPRISING THE SAME, COATED ARTICLE INCLUDING THE PHOTORESIST, AND METHOD FOR MANUFACTURING THE ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a photoacid generator that is soluble with an aqueous developer used for a resist material for high-resolution lithography and has low absorbance.;SOLUTION: A compound having formula (I) is provided. In the formula, a is an integer of from 1 to 10; x is an integer of from 1 to 3; X¹ represents a fluoroalcohol, a fluorinated ester or a fluorinated anhydride; Y represents a single bond, alkylene group having 1 to 20 carbon atoms, O, S, NR, ester, carbonate, sulfonate, sulfone or sulfonamide; Ar represents a monocyclic, polycyclic or condensed polycyclic cycloalkyl having 5 or more carbon atoms, or a monocyclic, polycyclic or condensed polycyclic aryl group having 5 or more carbon atoms; R¹ represents a substituted aryl having 5 to 40 carbon atoms, substituted heteroaryl having 5 to 40 carbon atoms, alkyl having 1 to 40 carbon atoms, or cycloalkyl having 3 to 40 carbon atoms; and Z^- represents a carboxylate, sulfate, sulfonate, sulfamate or anion of sulfonimide, wherein when Y is a single bond, Z^- is not sulfonate.;COPYRIGHT: (C)2014,JPO&INPIT