PHOTOACID GENERATING COMPOUND, PHOTORESIST COMPOSITION COMPRISING SAME, COATED ARTICLE COMPRISING PHOTORESIST, AND MANUFACTURING METHOD OF COATED ARTICLE

摘要

A compound denoted by chemical formula (I) is provided. In the chemical formula (I): a is an integer of 1-10; x is an integer of 1-3; X1 includes fluoroalcohol, fluorinated ester, or fluorinated anhydride; Y is a single bond, a C1-20 alkylene group, O, S, NR, ester, carbonate, sulfonate, sulfone, or sulfone amide, wherein R is H or C1-20 alkyl, and the C1-20 alkylene group is structured by only carbons or one or more structural carbon atoms among the C1-20 alkylene group are replaced by oxygen, carbonyl, ester, or a combination including at least one selected from the said compounds; and Ar is a substituted or non-substituted monocyclic, polycyclic, or fused polycyclic cycloalkyl group with C5 or more, or a substituted or non-substituted monocyclic, polycyclic, or fused polycyclic aryl group with C5 or more.;COPYRIGHT KIPO 2014