PROBLEM TO BE SOLVED: To provide a flawed site predictor capable of predicting sites where flaws are bound to be generated even if different process technologies are involved; an identification model generator; a flawed site prediction program; and a flawed site prediction method.;SOLUTION: An extraction unit 41 normalizes a layout pattern on which a flaw has been generated during a lithographic process based on the design rule of the layout pattern and extracts, from the normalized layout pattern, feature information expressing the feature of the flawed site. A generation unit 42 generates an identification model for identifying a flawed site based on the feature information extracted by the extraction unit 41 and a specified element of the design rule including a normalizing element used for the normalization. A prediction unit 43 normalizes a layout pattern targeted for inspection based on the design rule of the layout pattern, and predicts a site where a flaw is bound to be generated from the normalized layout pattern by using the identification model generated by the generation unit 42.;COPYRIGHT: (C)2014,JPO&INPIT
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