首页> 外国专利> POLISHING APPARATUS AND POLISHING METHOD FOR POLISHING PERIPHERAL EDGE PART OF WORKPIECE, E.G. PLATE GLASS WITH POLISHING TAPE

POLISHING APPARATUS AND POLISHING METHOD FOR POLISHING PERIPHERAL EDGE PART OF WORKPIECE, E.G. PLATE GLASS WITH POLISHING TAPE

机译:用于抛光工件的边缘部分的抛光装置和抛光方法,例如抛光玻璃板玻璃

摘要

PROBLEM TO BE SOLVED: To provide a polishing apparatus and a polishing method for polishing a peripheral edge part of a workpiece, e.g. a plate glass, with high precision.SOLUTION: A polishing apparatus includes a first polishing portion having a first horizontal polishing axis line for polishing a linear to-be-polished part of a peripheral edge part of a workpiece and a second polishing portion having a second horizontal polishing axis line for polishing a nonlinear to-be-polished part of the peripheral edge part of the workpiece. The first and second polishing portions each include a workpiece unit holding the workpiece and a polishing tape unit arranging at least a part of the surface of a polishing tape so as to face the work unit with the polishing axis line between the work unit and the polishing tape unit. The arranged surfaces of the polishing tape each constitute a polishing surface. In polishing, the linear to-be-polished part and a first polishing surface come in mutual contact and move relatively on the first polishing axis line, and the nonlinear to-be-polished part and a second polishing surface come into mutual contact and move relatively on the second polishing line.
机译:解决的问题:提供一种抛光设备和抛光方法,用于抛光工件的外围边缘部分,例如工件。解决方案:抛光装置包括:第一抛光部分,其具有用于抛光工件的周缘部分的线性待抛光部分的第一水平抛光轴线;以及第二抛光部分,其具有抛光的能力。第二水平抛光轴线,用于抛光工件外围边缘部分的非线性待抛光部分。第一抛光部和第二抛光部各自包括保持工件的工件单元和布置抛光带表面的至少一部分以便以在工作单元和抛光之间的抛光轴线面对工作单元的方式布置的抛光带单元。磁带机。抛光带的排列表面各自构成抛光表面。在抛光中,线性待抛光部分和第一抛光表面相互接触并在第一抛光轴线上相对移动,而非线性待抛光部分和第二抛光表面相互接触并移动。相对于第二条抛光线。

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