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Optical thin film and manufacturing method thereof, an optical multilayer film including an optical thin film, optical components, exposure apparatus and exposure method including an optical component having an optical film

机译:光学薄膜及其制造方法,包括光学薄膜的光学多层膜,光学部件,曝光装置以及包括具有光学膜的光学部件的曝光方法

摘要

PPROBLEM TO BE SOLVED: To provide an optical thin film containing a fluoride, which can be produced by using a general-purpose production facility, and has a fine structure that shows a high refractive index at a wave length of 200 nm or less, and to provide a production method for the optical thin film. PSOLUTION: The optical thin film includes fluorides of lanthanum and gadolinium, and the ratio of the number of moles of gadolinium with respect to the total number of moles of lanthanum and gadolinium is 0.01-0.95. The method for producing the optical thin film includes: preparing a substrate; preparing a vapor deposition material in which lanthanum fluoride and gadolinium fluoride are mixed so that the ratio of the number of moles of gadolinium with respect to the total number of moles of lanthanum and gadolinium becomes 0.1-0.95; and vapor-depositing the vapor deposition material on the substrate. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:

要解决的问题:提供一种包含氟化物的光学薄膜,其可以通过使用通用生产设备来生产,并且具有在波长200 nm或更高的波长下具有高折射率的精细结构。较少,并提供一种光学薄膜的生产方法。

解决方案:光学薄膜包括镧和g的氟化物,and的摩尔数相对于镧和g的总摩尔数之比为0.01-0.95。所述光学薄膜的制造方法包括:制备基板;制备混合有氟化镧和氟化g的气相沉积材料,使得g的摩尔数相对于镧和g的总摩尔数之比为0.1-0.95;在基板上蒸镀蒸镀材料。

版权:(C)2011,日本特许厅&INPIT

著录项

  • 公开/公告号JP5526745B2

    专利类型

  • 公开/公告日2014-06-18

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20090276118

  • 发明设计人 江面 嘉信;石沢 均;

    申请日2009-12-04

  • 分类号C23C14/06;G02B1/11;G02B3/00;H01L21/027;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 16:16:02

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