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OPTICAL THIN FILM, OPTICAL MEMBER, OPTICAL SYSTEM, PROJECTION EXPOSURE APPARATUS AND MANUFACTURING METHOD FOR OPTICAL THIN FILM

机译:光学薄膜,光学构件,光学系统,投影曝光设备和光学薄膜的制造方法

摘要

PPROBLEM TO BE SOLVED: To obtain an optical thin film in which interference conditions change slowly even when the solid state deposition of contaminants occurs, and the reduction of optical characteristics is suppressed. PSOLUTION: In the multi-layered optical thin film 10, at least two layers 11, 12 and 13 having different refractive index are layered on a base material, and the 1st layer 11 coming in contact with an incident medium is constituted of a porous layer having a pore filling density of 70%, and the gap 16 of the porous layer is formed into an open pore. PCOPYRIGHT: (C)2005,JPO&NCIPI
机译:

要解决的问题:获得即使在发生固态沉积污染物时干涉条件也缓慢变化的光学薄膜,并且抑制了光学特性的降低。

解决方案:在多层光学薄膜10中,具有不同折射率的至少两个层11、12和13被层叠在基材上,并且与入射介质接触的第一层11由以下材料构成:孔填充密度为70%的多孔层,该多孔层的间隙16形成为开放孔。

版权:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2004302112A

    专利类型

  • 公开/公告日2004-10-28

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20030094722

  • 发明设计人 MURATA TAKESHI;

    申请日2003-03-31

  • 分类号G02B1/10;B32B7/02;G02B1/11;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 23:33:55

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