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Resistance -change memory element , and , resistive nonvolatile memory , as well as , the resistance-change memory element control method

机译:电阻变化存储元件以及电阻变化型非易失性存储器以及电阻变化存储元件的控制方法

摘要

PPROBLEM TO BE SOLVED: To provide a resistance random access memory element achieving small variations in switching characteristics and suitable for high integration, and to provide a method of controlling the resistance random access memory element. PSOLUTION: The resistance random access memory element 20 includes: a variable resistance film having a titanium oxide film 2 and a zirconium oxide film 3; a first electrode 1 formed under the titanium oxide film 2; and a second electrode 4 formed on the zirconium oxide film 3. The titanium oxide film 2, a crystal grain of which easily grows larger, can be thinned, and the microcrystalline zirconium oxide film 3 is flat, thereby the surface irregularities of a zirconium oxide/titanium oxide laminated film can be reduced. When the resistance random access memory element is miniaturized, variations in electrical characteristics due to the surface irregularities of the variable resistance film can be reduced. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:<要解决的问题:提供一种电阻随机存取存储元件,该电阻随机存取存储元件的开关特性变化小并且适合于高集成度,并且提供一种控制电阻随机存取存储元件的方法。

解决方案:电阻随机存取存储元件20包括:可变电阻膜,具有氧化钛膜2和氧化锆膜3;在氧化钛膜2的下方形成第一电极1。形成在氧化锆膜3上的第二电极4。使容易成长的晶粒的氧化钛膜2变薄,并且微晶氧化锆膜3平坦,因此氧化锆的表面凹凸。可以减少氧化钛层压膜。当电阻随机存取存储元件被小型化时,可以减小由于可变电阻膜的表面不规则引起的电特性的变化。

版权:(C)2011,日本特许厅&INPIT

著录项

  • 公开/公告号JP5568950B2

    专利类型

  • 公开/公告日2014-08-13

    原文格式PDF

  • 申请/专利权人 日本電気株式会社;

    申请/专利号JP20090245656

  • 发明设计人 迫坪 行広;寺井 真之;

    申请日2009-10-26

  • 分类号H01L27/10;H01L45/00;H01L49/00;

  • 国家 JP

  • 入库时间 2022-08-21 16:15:55

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