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Body contact for the SRAM cells with the double-channel transistor

机译:SRAM单元与双通道晶体管的主体接触

摘要

Solutions Although it is possible, with configuration of dummy gate electrode structure (205A) can be categorized to cross direction the body contact between two double channel transistors and can being based on two double channel transistors (200N and 200P), and the choice transistor (200S) to form the static RAM electrolysis cell (250), the further rectangular contact (230) the gate electrode, it can do the source field and to joint the body contact conductivity pass to the body field of the transistor is established with that. This way, by comparison with the former body contact, it can establish quite three-dimensional efficient structure, it is possible to raise the bit density in the static RAM electrolysis cell remarkably. Choice figure Figure 2g
机译:解决方案尽管有可能,但伪栅极结构(205A)的配置可以归类为与两个双通道晶体管之间的体接触交叉,并且可以基于两个双通道晶体管(200N和200P)以及选择晶体管( 200S)形成静态RAM电解池(250),再与矩形电极(230)形成栅电极,它可以做源极场并把与之相连的体接触导电率传递给晶体管的体场而建立。这样,与以前的身体接触相比,它可以建立相当三维的高效结构,可以显着提高静态RAM电解池中的位密度。<选择图>图2g

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