Support film-forming composition and a measuring method for measuring the absorption coefficient of a thin film with extreme ultraviolet light

摘要

PPROBLEM TO BE SOLVED: To provide a measuring material for measuring a coefficient of absorption and an index of absorption of extreme UV light of a resist, a resist lower layer, a resist upper layer, a hard mask material, an antistatic material and the like; and to provide a measurement method. PSOLUTION: A supporting film formation composition for measuring the coefficient of absorption of extreme UV light includes a resin, an extreme UV light sensitive compound, a sensitive dyestuff and a solvent. The extreme UV light sensitive compound is a compound generating a radical, an acid or a base component by irradiation with extreme UV light. The sensitive dyestuff is a compound generating absorption change in 193 to 800 nm wavelength region by action of a radical, an acid or a base. The measurement method of the coefficient of extreme UV light of the film to be measured includes the steps of: applying the supporting film formation composition for measuring the coefficient of absorption of the extreme UV light on a substrate to form the supporting film for measuring the coefficient of absorption; applying a composition for forming a film to be measured on the supporting film to obtain the covered supporting film in which the film to be measured is formed; exposing the covered supporting film to the extreme UV light; and measuring light absorption spectrum change before and after exposure of the covered supporting film. PCOPYRIGHT: (C)2010,JPO&INPIT