Oxide sintered body target, the production method of the target, method for producing a transparent conductive film and a transparent conductive film

摘要

PPROBLEM TO BE SOLVED: To provide a transparent electroconductive film which is used for a display electrode of a flat panel display and the like, can be produced without the addition of water when an ITO-based amorphous transparent electroconductive film is formed with a sputtering method, has high etching properties and a low crystallization temperature, and possesses high levels of low resistivity and high transmissivity after having been crystallized, and to provide a sintered target which does not cause abnormal electric discharge when the transparent electroconductive film is formed with the sputtering method. PSOLUTION: The sintered target includes indium oxide as a main component, and Ge of such an amount that Ge/(Ge+In) becomes 6-16% by atom%, and has other various characteristics. The amorphous transparent electroconductive film is obtained by sputtering the target under a predetermined condition. The crystalline transparent electroconductive film is obtained by annealing the amorphous transparent electroconductive film. PCOPYRIGHT: (C)2010,JPO&INPIT