The scanning electron microscope, measuring method, through stage and aforementioned horuda

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam device of a critical-dimension measuring scanning electron microscope (CD-SEM) or the like, measuring accurately a pattern dimension on a photomask for nanoimprint by a retarding voltage application system.;SOLUTION: An attachment for mounting the photomask for nanoimprint on a holder is used. A magnification deviation is determined, and a measurement result of a pattern dimension on the photomask for nanoimprint is corrected by using the deviation. The magnification deviation is determined by using a sample for calibrating a dimension of the holder and a sample for calibrating a dimension of the photomask for nanoimprint. Further, the magnification deviation may be determined from a charged voltage of the photomask for nanoimprint.;COPYRIGHT: (C)2011,JPO&INPIT