Chemical vapor deposition method for producing an organosilica glass film of a porous

摘要

PROBLEM TO BE SOLVED: To provide a deposition method for producing a porous organosilica glass film.;SOLUTION: A deposition method for producing a porous organosilica glass film includes the steps of: introducing a gaseous reagent into a vacuum chamber, wherein the gaseous reagent contains one precursor of an organosilane or an organosiloxane, and a porogen that is distinct from the precursor and is aromatic essentially; applying energy to the gaseous reagent in the vacuum chamber to induce a reaction of the gaseous reagent, thereby to deposit a film containing the porogen; and removing substantially all of the organic materials by UV radiation to provide a porous film having pores and a dielectric constant of less than 2.6.;COPYRIGHT: (C)2011,JPO&INPIT