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The device simulation device, the local density of states

机译:设备模拟设备,局部状态密度

摘要

PROBLEM TO BE SOLVED: To provide an effective impurity potential calculating method for numerically and stably calculating effective impurity potential with respect to discrete impurities in a semiconductor without including an arbitrary parameter.;SOLUTION: The effective impurity potential calculating method includes: a process (step S1) for calculating a local state density when one impurity exists in the semiconductor; a process (step S2) for calculating a local electronic density at prescribed temperature and in a Fermi level, based on the local state density; a process (step S3) for calculating an electronic density at prescribed temperature and in the Fermi level as a free electronic density, based on a free electronic state density; and a process (steps S3-S5) for determining the band edge energy of the free electronic state density so as to allow the local electronic density to coincide with the free electronic density, and (step S6) for allowing the determined band edge energy to be defined as the effective impurity potential by the impurities.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种有效的杂质电势计算方法,以数字方式且稳定地计算半导体中离散杂质的有效杂质电势,而不包括任意参数。解决方案:有效的杂质电势计算方法包括:过程(步骤S1),当半导体中存在一种杂质时,计算局部态密度;处理(步骤S2),用于基于局部状态密度在规定温度和费米能级下计算局部电子密度;处理(步骤S3),基于自由电子状态密度,将规定温度下的费米能级的电子密度计算为自由电子密度。用于确定自由电子态密度的带边缘能量以便使局部电子密度与自由电子密度一致的过程(步骤S3-S5),以及用于使确定的带边缘能量被杂质定义为有效杂质势。;版权所有:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP5391545B2

    专利类型

  • 公开/公告日2014-01-15

    原文格式PDF

  • 申请/专利权人 日本電気株式会社;

    申请/专利号JP20070316100

  • 发明设计人 竹田 裕;

    申请日2007-12-06

  • 分类号H01L29/00;H01L21/00;

  • 国家 JP

  • 入库时间 2022-08-21 16:13:06

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