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Resist composition and patterning process using novel sulfonate salts and derivatives thereof, photoacid generator and this
Resist composition and patterning process using novel sulfonate salts and derivatives thereof, photoacid generator and this
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机译:使用新型磺酸盐及其衍生物,光致产酸剂和该树脂的抗蚀剂组成和构图工艺
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摘要
There is disclosed a sulfonate shown by the following general formula (2). R1—COOC(CF3)2—CH2SO3−M+  (2) (In the formula, R1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M+ represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.
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机译:公开了由以下通式(2)表示的磺酸盐。 R 1 -COOC(CF 3)2 -CH 2 SO 3 -M +(2)(式中,R 1表示碳原子数为1〜50的直链状,支链状或环状的一价烃基,可任选含有杂原子。 M +表示阳离子。)可以提供:一种新型的磺酸盐,其对于化学放大的抗蚀剂组合物有效,该组合物在抗蚀剂溶剂和树脂中具有足够高的溶解性(相容性),良好的储存稳定性,PED稳定性,进一步。较宽的焦深,良好的感光度,尤其是高分辨率和良好的图案轮廓形式;光敏酸产生剂;使用该抗蚀剂组合物;光掩模坯料和构图过程。
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