Novel Sulfonate Salts and Derivatives, Photoacid Generators, Resist Compositions, and Patterning Process

摘要

Sulfonate salts have the formula: R1COOCH2CH2CF2CF2SO3-M+ wherein R1 is alkyl, aryl or hetero-aryl, M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.