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A lithographic apparatus including an optical element for a lithographic apparatus, such an optical element, and method of manufacturing such an optical element
A lithographic apparatus including an optical element for a lithographic apparatus, such an optical element, and method of manufacturing such an optical element
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机译:包括用于光刻设备的光学元件的光刻设备,例如光学元件,以及制造这种光学元件的方法
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摘要
A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.
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