首页> 外国专利> Internal stress formation formation monocrystal component and monocrystal substrate production manner

Internal stress formation formation monocrystal component and monocrystal substrate production manner

机译:形成内应力的单晶成分及单晶基板的制造方法

摘要

Being large relatively, it designates the monocrystal substrate production manner which can produce the thin monocrystal substrate easily and that the internal stress formation formation monocrystal component is offered as topic. Inside the monocrystal component, the surface of irradiation side of the monocrystal component (10t) from laser light is done by the fact that it condenses, the surface (10t) with only alienation the surface (10t) with parallel extending stress formation of the two-dimensional condition which is present (13u) inside it possesses the reforming formation formation monocrystal component (11) with.
机译:相对大的是,提出了一种可以容易地制造薄的单晶基板并提供内应力形成形成单晶成分的单晶基板的制造方法。在单晶组件内部,单晶组件(10t)从激光的照射侧的表面是这样形成的,即它会凝结,仅使表面(10t)与表面(10t)疏远,并形成两个平行延伸的应力内部存在的三维条件(13u)具有重整形成形成单晶成分(11)。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号