Resist composition and patterning process using novel sulfonate salts and derivatives thereof, photoacid generator and this

摘要

PPROBLEM TO BE SOLVED: To provide a photoacid generator that is highly sensitive to an ArF excimer laser beam and the like, gives no concerns about the accumulation in the human body, generates an acid (photoacid) having sufficiently high acidity, has high solubility in a resist solvent, and is excellently compatible with a resin, and a resist material comprising such a photoacid generator. PSOLUTION: The photoacid generator generates a sulfonic acid represented by general formula (2) (wherein n is an integer of 1-10; and R is a 1-20C substituted or unsubstituted linear, branched or cyclic alkyl or alkenyl group, a 6-15C substituted or unsubstituted aryl group, or a 4-15C heteroaryl group). A resist pattern formed by using such a photoacid generator exhibits excellent performances in adhesion to a substrate and etching resistance. PCOPYRIGHT: (C)2010,JPO&INPIT