首页> 外国专利> It is low, in regard to copper wiring the metal layer which at least contains the metal component of 1 where it is chosen from

It is low, in regard to copper wiring the metal layer which at least contains the metal component of 1 where it is chosen from

机译:就铜布线而言,至少包含1的金属成分的金属层的铜布线低

摘要

PROBLEM TO BE SOLVED: To provide a multilayer wiring board which has low dielectric loss and low conductor loss and has high adhesive strength between copper wiring and an insulating layer and has a chemically stable adhesion interface, and to provide a copper foil, a laminate and a wiring board used for the multilayer wiring board.;SOLUTION: Copper wiring or copper foil and an insulating layer composed of a low-dielectric-loss material is joined via an adhesion interface having a multilayer structure which includes: a metal layer (A) containing at least one kind of metal component selected from among tin, nickel, chromium, zinc, cobalt and aluminum; a layer of oxide and/or a layer of hydroxide (B) of the metal component of the metal layer on the metal layer (A); an amine-based silane coupling agent layer (C) on the layer (B); and a vinyl-based silane coupling agent layer (D) on the layer (C).;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种多层布线板,该多层布线板具有低介电损耗和低导体损耗,并且在铜布线和绝缘层之间具有高粘合强度,并且具有化学稳定的粘合界面,并且提供了铜箔,层压板和SOLUTION:铜布线或铜箔与由低介电损耗材料组成的绝缘层通过具有多层结构的粘合界面连接在一起,该粘合界面包括:金属层(A)含有选自锡,镍,铬,锌,钴和铝中的至少一种金属成分;金属层(A)上的金属层的金属成分的氧化物层和/或氢氧化物层(B);在层(B)上的胺基硅烷偶联剂层(C); (C)2011,JPO&INPIT;在层(C)上的乙烯基类硅烷偶联剂层(D)。

著录项

  • 公开/公告号JP5463117B2

    专利类型

  • 公开/公告日2014-04-09

    原文格式PDF

  • 申请/专利权人 株式会社日立製作所;

    申请/专利号JP20090240975

  • 发明设计人 鍵和田 光;堀 大;天羽 悟;

    申请日2009-10-20

  • 分类号H05K3/46;H05K1/09;H05K3/38;

  • 国家 JP

  • 入库时间 2022-08-21 16:11:33

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号