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摘要

PROBLEM TO BE SOLVED: To provide a film deposition system capable of ensuring film quality, reducing the size and the cost of the system, and capable of depositing a uniform film at high throughput even in a large-sized substrate 2.;SOLUTION: The film deposition system comprises: a film deposition chamber 3 storing the substrate 2 at the inside; and an injection valve 4 arranged so as to be separated by a prescribed distance from the substrate 2; and an injection valve 4 injecting a film deposition raw material into the film deposition chamber 3 in a liquid state. The shape of the cross-sectional face of an injection hole H provided at the injection valve 4 has almost fixed dimensions to the short side direction, and is spread as it approaches from the inlet to the outlet in the longitudinal side direction, and at least forms a belt shape in the vicinity of the outlet. The spreading angle θ_o of the injection hole H is ≤180°, and the angle formed between the side face H1 in the short side direction of H and the inside face 41B1 of the injection valve connecting to the side face H1 is 0 to 90°.;COPYRIGHT: (C)2009,JPO&INPIT