首页> 外国专利> Semiconductor device design method and the shift register and the shift register circuit

Semiconductor device design method and the shift register and the shift register circuit

机译:半导体器件的设计方法以及移位寄存器和移位寄存器电路

摘要

PROBLEM TO BE SOLVED: To provide a transistor whose overlap capacitance can be reduced, thereby obtaining a shift register circuit which prevents a reduction in a power supply voltage margin.;SOLUTION: An NMOS transistor Q3 to be inserted between a second power supply terminal S2 and a node N1 is configured by using four NMOS transistors Q3a-Q3d connected in parallel so that source and drain electrodes (source electrodes 4 of the NMOS transistors Q3a-Q3d, and drain electrodes 3 of the NMOS transistors Q3b and Q3c) other than drain electrodes of transistor terminal portions (drain electrodes 3 of the NMOS transistors Q3a and Q3d) can be reliably formed on an a-Si semiconductor region 2 formed on a gate electrode 1. Moreover, a formation width L of the source electrode 4 connected to the node N1 is caused to be smaller than the sum of gate-source electrode overlap widths a1 and a2 in a region B of the transistor terminal portion.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种晶体管,该晶体管的重叠电容可以减小,从而获得防止电源电压裕度降低的移位寄存器电路。解决方案:在第二电源端子S2之间插入NMOS晶体管Q3。通过使用并联连接的四个NMOS晶体管Q3a-Q3d来配置节点N1,以使漏极以外的源极和漏极(NMOS晶体管Q3a-Q3d的源极4,NMOS晶体管Q3b和Q3c的漏极3)可以在形成在栅电极1上的a-Si半导体区域2上可靠地形成晶体管端子部的电极(NMOS晶体管Q3a和Q3d的漏极电极3)。此外,连接到栅极电极1的源极电极4的形成宽度L。使节点N1小于晶体管端子部分的区域B中的栅源电极重叠宽度a1和a2的总和。版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP5436049B2

    专利类型

  • 公开/公告日2014-03-05

    原文格式PDF

  • 申请/专利权人 三菱電機株式会社;

    申请/专利号JP20090129943

  • 发明设计人 村井 博之;宮山 隆;

    申请日2009-05-29

  • 分类号G11C19/28;G11C19/00;G09G3/36;G09G3/20;

  • 国家 JP

  • 入库时间 2022-08-21 16:10:55

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号