首页>
外国专利>
Graphene and nanotube/nanowire transistor with a self-aligned gate structure on transparent substrates and method of making same
Graphene and nanotube/nanowire transistor with a self-aligned gate structure on transparent substrates and method of making same
展开▼
机译:在透明基板上具有自对准栅极结构的石墨烯和纳米管/纳米线晶体管及其制造方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
Transistor devices having a self-aligned gate structure on transparent substrates and techniques for fabrication thereof are provided. In one aspect, a method of fabricating a transistor device includes the following steps. A channel material is formed on a transparent substrate. Source and drain electrodes are formed in contact with the channel material. A dielectric layer is deposited on the channel material. A photoresist is deposited on the dielectric layer and developed using UV light exposure through the transparent substrate. A gate metal(s) is deposited on the exposed portions of the dielectric layer and the undeveloped portions of the photoresist. The undeveloped portions of the photoresist are removed along with portions of the gate metal over the source and drain regions to form a gate of the device on the dielectric layer over the channel material which is self-aligned to the source and drain electrodes.
展开▼