Manufacturing Method Of An Amorphous-Silicon Flat-Panel X-Ray Sensor

摘要

The present invention relates to sensor technical fields, a kind of production method of amorphous silicon flat panel X ray sensor is provided, during making a kind of amorphous silicon flat panel X ray sensor, reduce the number that mask plate uses, it simplifies production process and also as save production cost, the yields of product can also be improved while simplifying production process. The production method includes: after forming controlling grid scan line on substrate, it is formed data line by a patterning processes, TFT switch element and photoinduction element, wherein, region partial light permeability corresponding with the channel of the TFT switch element on mask plate in the patterning processes, it is opaque with the corresponding region of channel portion is removed in the data line, photoinduction element and TFT switch element; Passivation layer and bias line are formed on the substrate for foring TFT switch element and photoinduction element.