首页>
外国专利>
Enhanced etch and deposition profile control using plasma sheath engineering
Enhanced etch and deposition profile control using plasma sheath engineering
展开▼
机译:使用等离子护套工程技术增强蚀刻和沉积轮廓控制
展开▼
页面导航
摘要
著录项
相似文献
摘要
A plasma processing tool is used to deposit material on a workpiece. For example, a method for conformal deposition of material is disclosed. In this embodiment, the plasma sheath shape is modified to allow material to impact the workpiece at a range of incident angles. By varying this range of incident angles over time, a variety of different features can be deposited onto. In another embodiment, a plasma processing tool is used to etch a workpiece. In this embodiment, the plasma sheath shape is altered to allow ions to impact the workpiece at a range of incident angles. By varying this range of incident angles over time, a variety of differently shaped features can be created.
展开▼