首页> 外国专利> Cu-Ga Target, Method of Producing Same, Light-absorbing Layer Formed from Cu-Ga Based Alloy Film, and CIGS System Solar Cell Having the Light-absorbing Layer

Cu-Ga Target, Method of Producing Same, Light-absorbing Layer Formed from Cu-Ga Based Alloy Film, and CIGS System Solar Cell Having the Light-absorbing Layer

机译:Cu-Ga靶,其制造方法,由Cu-Ga基合金膜形成的光吸收层以及具有该光吸收层的CIGS系统太阳能电池

摘要

A Cu—Ga alloy sintered-compact sputtering target having a Ga concentration of 40 to 50 at % and Cu as the balance, wherein the sintered-compact sputtering target is characterized in that the relative density is 80% or higher, and the compositional deviation of the Ga concentration is within ±0.5 at % of the intended composition. A method of producing a Cu—Ga alloy sintered-compact sputtering target having a Ga concentration of 40 to 50 at % and Cu as the balance, wherein the method thereof is characterized in that Cu and Ga raw materials are melted and cooled/pulverized to produce a Cu—Ga alloy raw material powder, and the obtained material powder is further hot-pressed with a retention temperature being between the melting point of the mixed raw material powder and a temperature 15° C. lower than the melting point and with a pressure of 400 kgf/cm2 or more applied to the sintered mixed raw material powder. Provided are a sputtering target having very low compositional deviation and high density; a method of producing the target; a light-absorbing layer having a Cu—Ga based alloy film; and a CIGS solar cell including the light-absorbing layer.
机译:以Ga浓度为40〜50at%且余量为Cu的Cu-Ga合金烧结体溅射靶,其特征在于,相对密度为80%以上,且组成偏差Ga浓度的最大值在预期组成的±0.5at%内。一种Ga浓度为40〜50at%且余量为Cu的Cu-Ga合金烧结体溅射靶的制造方法,其特征在于,将Cu和Ga原料熔融,冷却/粉碎成粉末状。制备Cu-Ga合金原料粉末,并将得到的原料粉末在保持温度在混合原料粉末的熔点和低于熔点的温度15℃之间的条件下进一步热压。将400kgf / cm 2 或更高的压力施加到烧结的混合原料粉末上。提供一种具有非常低的组成偏差和高密度的溅射靶;产生靶的方法;具有Cu-Ga基合金膜的光吸收层;包括光吸收层的CIGS太阳能电池。

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