首页>
外国专利>
Chemical vapor deposition apparatus capable of controlling discharging fluid flow path in reaction chamber
Chemical vapor deposition apparatus capable of controlling discharging fluid flow path in reaction chamber
展开▼
机译:能够控制反应室内的排出流体流路的化学气相沉积装置
展开▼
页面导航
摘要
著录项
相似文献
摘要
A chemical vapor deposition apparatus is equipped to control the width of a gas discharge path between a susceptor and an inner surface of a chamber without having to resort to redesign and remanufacturing of the apparatus. The chemical vapor deposition apparatus includes: a chamber; a susceptor positioned inside the chamber and on which a substrate can be loaded; a shower head injecting a processing gas toward the substrate; and a guide unit detachably installed inside the chamber to guide the processing gas such that the processing gas injected from the shower head is discharged through a chamber hole formed in the chamber.
展开▼