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Single-cap via-in-pad and methods for forming thereof

机译:单盖焊盘通孔及其形成方法

摘要

Methods for the formation of single-cap VIPs in a substrate are described herein. The methods may include initially providing a substrate having a first and a second side, the first side being opposite of the second side. A via may then be constructed in the substrate, the via being formed within a via hole that extends from the first side to the second side of the substrate, the formed via having a first end located at the first side of the substrate, and a second end opposite the first end located at the second side of the substrate. A selective deposition may be performed of a conductive material on the second end of the via to form a conductive pad directly on the via on the second side of the substrate without depositing the conductive material onto the first side of the substrate.
机译:本文描述了在基底中形成单帽VIP的方法。该方法可以包括首先提供具有第一侧面和第二侧面的基板,该第一侧面与第二侧面相反。然后可以在基板中构造通孔,该通孔形成在从基板的第一侧延伸到第二侧的通孔内,形成的通孔具有位于基板的第一侧的第一端,以及第二端与位于基板第二侧的第一端相对。可以在通孔的第二端上执行导电材料的选择性沉积,以在衬底的第二侧上的通孔上直接形成导电焊盘,而无需将导电材料沉积到衬底的第一侧上。

著录项

  • 公开/公告号US8772647B1

    专利类型

  • 公开/公告日2014-07-08

    原文格式PDF

  • 申请/专利权人 CHIEN TE CHEN;

    申请/专利号US201213443508

  • 发明设计人 CHIEN TE CHEN;

    申请日2012-04-10

  • 分类号H01K3/10;H05K1/11;

  • 国家 US

  • 入库时间 2022-08-21 16:00:53

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