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Frequency domain layout decomposition in double patterning lithography
Frequency domain layout decomposition in double patterning lithography
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机译:双图案光刻中的频域布局分解
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摘要
A mechanism is provided for frequency domain layout decomposition in double pattern lithography (DPL) based on Fourier coefficient optimization (FCO). The Fourier transform of a layout represents the spatial frequency terms present in the layout. The mechanism models decomposed patterns for two exposures as a function of the corresponding Fourier coefficients. For each exposure, the mechanism sets the corresponding Fourier coefficients to zero for spatial frequency terms greater than the cut-off frequency of the optical system. The mechanism then optimizes non-zero Fourier coefficients for the two exposures to decompose the original target. The mechanism provides frequency domain optimization instead of conventional spatial domain methods, which naturally leads to optics-aware decomposition and stitch insertion in arbitrary two dimensional patterns.
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