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METHOD OF CONDUCTING A PVCD DEPOSITION PROCEDURE AND APPLIANCE FOR A PCVD DEPOSITION PROCESS
METHOD OF CONDUCTING A PVCD DEPOSITION PROCEDURE AND APPLIANCE FOR A PCVD DEPOSITION PROCESS
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机译:进行pvcd沉积过程的方法和用于pCVD沉积过程的装置
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摘要
Method of Conducting a PCVD Deposition Process and Apparatus for Conducting a PCVD Deposition Process The present invention relates to an apparatus for conducting a PCVD deposition process, wherein one or more layers of doped glass or Uncoated are coated on the inner side of a glass substrate tube, wherein the apparatus comprises an applicator having an inner wall and an outer wall and a microwave guide opening to the applicator, wherein the applicator extends around a cylindrical axis and which is equipped with a passage adjacent to the inner wall through which the microwaves provided by means of the microwave guide may exit, on which cylindrical axis the substrate tube may be positioned, while the applicator is completely surrounded by a furnace extending over said cylindrical axis.
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