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METHOD OF CONDUCTING A PVCD DEPOSITION PROCEDURE AND APPLIANCE FOR A PCVD DEPOSITION PROCESS

机译:进行pvcd沉积过程的方法和用于pCVD沉积过程的装置

摘要

Method of Conducting a PCVD Deposition Process and Apparatus for Conducting a PCVD Deposition Process The present invention relates to an apparatus for conducting a PCVD deposition process, wherein one or more layers of doped glass or Uncoated are coated on the inner side of a glass substrate tube, wherein the apparatus comprises an applicator having an inner wall and an outer wall and a microwave guide opening to the applicator, wherein the applicator extends around a cylindrical axis and which is equipped with a passage adjacent to the inner wall through which the microwaves provided by means of the microwave guide may exit, on which cylindrical axis the substrate tube may be positioned, while the applicator is completely surrounded by a furnace extending over said cylindrical axis.
机译:进行PCVD沉积工艺的方法和进行PCVD沉积工艺的设备技术领域本发明涉及一种进行PCVD沉积工艺的设备,其中在玻璃基板管的内侧上涂覆一层或多层掺杂玻璃或未涂覆的玻璃。 ,其中所述装置包括具有内壁和外壁的施药器以及通向施药器的微波引导器,其中施药器绕圆柱轴延伸,并且配备有与内壁相邻的通道,通过该通道,提供的微波微波导管的装置可以退出,衬底管可以定位在该圆柱轴上,而敷抹器完全被在所述圆柱轴上延伸的炉子包围。

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