SOURCE OF PLASMA FOR APPLICATION OF THIN-FILM COATINGS USING PLASMA AND CHEMICAL DEPOSITION FROM THE GAS PHASE (OPTIONS)

摘要

The application describes new plasma sources suitable for use in thin-film coating technology and methods of using these sources. In particular, the present invention proposes new linear and two-dimensional plasma sources, which create a linear and two-dimensional plasma, respectively, which is suitable for plasma-chemical deposition from the gas phase.