FABRICATION METHOD OF SINGLE MODE OPTICAL WAVEGUIDE

摘要

A METHOD OF FABRICATING AN OPTICAL WAVEGUIDE DEVICE IN ACCORDANCE WITH THE PRESENT INVENTION INCLUDES THE STEPS OF PROVIDING (S30) A SUBSTRATE (11), COATING (S31) A LAYER OF POLYMER (12) ONTO THE SUBSTRATE (11), PATTERNING (S33) THE POLYMER LAYER (12) TO CREATE A WAVEGUIDE CORE (15), DEVELOPING (S34) THE FORMED WAVEGUIDE CORE (15) TO OBTAIN THE ACTUAL PATTERN SAMPLE, CURING (S35) THE SAMPLE TO ENSURE A COMPLETE CHEMICAL REACTION, AND DEPOSITING (S36) A LAYER OF SILICON OXIDE (18) ONTO THE CURED SAMPLE, WHEREIN SAID SILICONE OXIDE DEPOSITION PROCESS IS CARRIED OUT BY MEANS OF PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION (PECVD) TECHNIQUE AT TEMPERATURE OF PPROXIMATELY 60°C FOR ABOUT 1 HOUR, WHEREIN SAID DEPOSITED SILICONE OXIDE LAYER HAS A THICKNESS OF APPROXIMATELY 1µm. MOST ILLUSTRATIVE DIAGRAM: FIG. 1