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DEFECT-CAUSING-STEP ANALYSIS DEVICE AND DEFECT-CAUSING-STEP ANALYSIS METHOD
DEFECT-CAUSING-STEP ANALYSIS DEVICE AND DEFECT-CAUSING-STEP ANALYSIS METHOD
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机译:缺陷原因阶梯分析装置和缺陷原因阶梯分析方法
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摘要
A linking unit (17) of a defect-causing-step analysis device (16) reads lighting defect information and TFT correction information relating to a single liquid crystal display panel from an information management database (9) and correlates (performs so-called linking) both types of results. A classifying unit (18) classifies the lighting defect information by the TFT correction information. A superposition mapping unit (19) superposes and maps the classified lighting defect information on the same coordinates in relation to one or several lots of the liquid crystal display panel. A map display unit (20) displays one or a plurality of superposed maps set in advance or specified by an operator from among a plurality of superposed maps obtained as described above. Analysis is thus performed as to whether the cause of a defect detected by a final inspection is due to a process step or an inspection step.
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