METHOD FOR PREPARING A SUBSTANTIALLY CLEAN MONOLAYER OF A TWO-DIMENSIONAL MATERIAL

摘要

A method for preparing a substantially clean monolayer of a two-dimensional material comprises the steps of: providing a first substrate (S1) having a first substrate surface (F1); growing a monolayer (G) of the two-dimensional material on the first substrate surface; applying a resin capping layer (R) on the first substrate surface so as to integrally cover the monolayer; etching away the first substrate to obtain a resin body having a resin body surface (FR) with the monolayer attached thereto; providing a second substrate (S2) having a second substrate surface (F2) being substantially congruent to the resin body surface; forming an assembly of the resin body and the second substrate by contacting the mutually congruent resin body surface and second substrate surface; and subjecting the assembly thus obtained to a thermal annealing process in ambient air so as to completely remove the resin body. By carrying out the thermal annealing process in the presence of a platinum metal (PM) contacting either the monolayer or the resin body, a substantially clean monolayer of the two-dimensional material on the second substrate surface is formed.