首页> 外国专利> METHOD FOR STORING METALLIC LANTHANUM TARGET, VACUUM-SEALED METALLIC LANTHANUM TARGET, AND THIN FILM FORMED BY SPUTTERING USING METALLIC LANTHANUM TARGET

METHOD FOR STORING METALLIC LANTHANUM TARGET, VACUUM-SEALED METALLIC LANTHANUM TARGET, AND THIN FILM FORMED BY SPUTTERING USING METALLIC LANTHANUM TARGET

机译:存储金属镧靶,真空密封金属镧靶和利用金属镧靶溅射形成的薄膜的方法

摘要

A method of storing a metal lanthanum sputtering target, wherein a surface of a metal lanthanum target to be stored is processed so as to achieve a roughness Ra of 1 µm or less, a lanthanum fluoride coating is formed on the surface thereof, the metal lanthanum target to which the lanthanum fluoride coating was formed is subsequently charged in a vacuum pack with an oxygen transmission rate of 0.1 cm3/m2 per 24 h at 1 atm or less and a moisture vapor transmission rate of 0.1 g/m2 per 24 h or less, and the vacuum pack is thereafter subject to vacuum suction and sealing for storage. This invention aims to provide technology for enabling the long-term storage of a sputtering target in a usable state by devising the method of storing a metal lanthanum target as a rare earth metal, and thereby inhibiting the degradation phenomenon caused by the oxidation of the target due to residual air or the inclusion of air.
机译:一种金属镧溅射靶的存储方法,其中,将要存储的金属镧靶的表面进行处理,以使粗糙度Ra达到1μm或更小,在其表面上形成氟化镧涂层,所述金属镧随后将形成了氟化镧涂层的靶材放入真空包装中,在1个大气压或以下的条件下,氧气透过率为每24小时0.1 cm3 / m2,湿气透过率为每24小时或以下0.1 g / m2 ,然后对真空包装进行真空抽吸和密封,以进行存放。本发明旨在提供一种技术,该技术通过设计将金属镧靶作为稀土金属进行存储的方法,从而能够抑制溅射靶在氧化状态下引起的劣化现象,该溅射靶能够以可用状态长期保存。由于残留空气或包含空气。

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