SURFACE TREATMENT METHOD FOR SILICON SUBSTRATE, PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE, PRODUCTION DEVICE FOR SEMICONDUCTORS, TRANSFER MEMBER AND PRODUCTION METHOD THEREFOR, AND SOLAR CELL AND SOLAR CELL PRODUCTION METHOD

摘要

[Solution] A surface treatment method for a silicon substrate, being one embodiment of the present invention and whereby a second metal having a minute catalytic function is supported on the surface of a transfer member comprising a first metal having a catalytic function, and is brought into contact upon or brought close to the silicon substrate, in a treatment solution capable of oxidizing and dissolving silicon, thereby forming a nanocrystal structural layer on a surface section of the silicon substrate. As a result the reflectivity for a visible light area on the silicon substrate surface is reduced slightly by no more than 2-3% and a solar cell having high photoelectric conversion can be obtained.