SYMMETRY RESTORING LINER FOR MODULATING AZIMUTHAL NON-UNIFORMITY IN PLASMA PROCESSING SYSTEM

摘要

Disclosed are a device and a method for modulating azimuthal non-uniformity in a plasma processing chamber. The device comprises a plasma processing chamber and a plasma processing system with a chamber liner. The step of modulating azimuthal non-uniformity comprises the step of providing a conductive strap set which consists of more than eight conductive straps for connecting the chamber liner to a grounding ring. Alternatively or additionally, a mirror cut-out is provided for a corresponding existing cut-out or a port in the chamber liner. Also, a dummy structure is provided with the chamber liner for a corresponding structure which interrupts gas flow in the chamber and/or an RF current return path.;COPYRIGHT KIPO 2014;[Reference numerals] (AA,CC) Exhaust; (BB) Prior art