首页> 外国专利> THERMOELECTRIC BISMUTH NANOWIRE WITH SUPERB THERMOELECTRIC PERFORMANCE AND METHOD FOR MANUFACTURING THERMOELECTRIC NANODEVICE HAVING SAME

THERMOELECTRIC BISMUTH NANOWIRE WITH SUPERB THERMOELECTRIC PERFORMANCE AND METHOD FOR MANUFACTURING THERMOELECTRIC NANODEVICE HAVING SAME

机译:具有超热电性能的热电铋纳米管和制造具有相同性能的热电纳米器件的方法

摘要

Provided are a single crystal thermoelectric nanowire with superb thermoelectric performance and a method for manufacturing a thermoelectric nanodevice having the same. The present invention provides a method for manufacturing a thermoelectric nanodevice comprising the following steps. A single crystal thermoelectric nanowire with an adjusted diameter smaller than or equal to 40 nm and a thermoelectric figure of merit greater than or equal to 0.5 is stacked on a substrate. A copolymer layer is formed on the substrate to include the nanowire, and an electron beam resist is formed thereon. An electron beam lithography process is performed such that portions of the copolymer layer and an electron beam resist layer are etched to expose at least a portion of the nanowire. After a surface oxide layer of the exposed nanowire is removed by using a plasma etching method in the chamber, an ohmic contact is deposited in-situ on the nanowire with the oxide layer removed, and the copolymer layer and the electron beam resist layer are removed from the nanowire. Then, an electrode is formed.;COPYRIGHT KIPO 2014
机译:提供了具有优异的热电性能的单晶热电纳米线及其制造方法。本发明提供了一种用于制造热电纳米器件的方法,其包括以下步骤。将调节直径小于或等于40nm且热电品质因数大于或等于0.5的单晶热电纳米线堆叠在基板上。在基板上形成包括纳米线的共聚物层,并在其上形成电子束抗蚀剂。进行电子束光刻工艺,以使共聚物层和电子束抗蚀剂层的一部分被蚀刻以暴露出纳米线的至少一部分。在腔室中通过使用等离子体蚀刻方法去除暴露的纳米线的表面氧化物层之后,在去除了氧化物层的情况下在纳米线上原位沉积欧姆接触,并且去除了共聚物层和电子束抗蚀剂层来自纳米线。然后,形成电极。; COPYRIGHT KIPO 2014

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