PHOTO-CURABLE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, PROTECTIVE FILM FOR ELECTIC/ELECTRONIC PART, AND ELECTIC/ELECTRONIC PART

摘要

The objective of the present invention is to provide a photo-curable resin composition including a silicon-containing polymer compound and a specific photo base generator, a method of forming a pattern, and a passivation film for electric and electronic part protection, which facilitate pattern formation; provide a passivation film having good film properties, especially good adhesion to a base used in a circuit substrate; and further provide a passivation film having high reliability, especially excellent copper migration resistance, for use in electric and electronic parts. To solve the above-described objective, the present invention provides a photo-curable resin composition including a silicon-containing polymer compound having a repeating unit represented by formula (1) and a weight average molecular weight of 3,000-500,000, a photo base generator represented by formula (4), a solvent, and a cross-linking agent containing an epoxy resin as occasion demands.