首页> 外国专利> RESPONDING RESIDUAL PRODUCT PROCESSOR, METHOD FOR PROCESSING RESPONDING RESIDUAL PRODUCT, AND MANUFACTURE EQUIPMENT OF SEMICONDUCTOR DEVICE HAVING RESPONDING RESIDUAL PRODUCT PROCESSOR

RESPONDING RESIDUAL PRODUCT PROCESSOR, METHOD FOR PROCESSING RESPONDING RESIDUAL PRODUCT, AND MANUFACTURE EQUIPMENT OF SEMICONDUCTOR DEVICE HAVING RESPONDING RESIDUAL PRODUCT PROCESSOR

机译:响应残余产品处理器,响应残余产品的处理方法以及具有响应残余产品处理器的半导体设备的制造设备

摘要

In a responding residual product processor and manufacture equipment of a semiconductor device having the same, directly connected are a coercive delivery unit coercively delivering a responding residual product of an object to be purified and a residual product purifying unit purifying by drawing the responding residual product inside and separating the same into power and by-product gas. Accordingly, the responding residual product is supplied from the coercive delivery unit to the residual product purifying unit without flowing pipeline. The responding residual product processor selects a proper exhausting pipe according to the flowing amount of the purified by-product gas, and prevents the decline of the flowing velocity and the deposition of the power while the responding residual product moves along the flowing pipeline.;COPYRIGHT KIPO 2014
机译:在响应残留产品处理器和具有该响应残留产品处理器的半导体装置的制造设备中,直接连接有强制输送单元和矫正残留产品纯化单元,该矫顽输送单元强制输送要纯化的对象的响应残留产品,该残留产品纯化单元通过将响应残留产品吸入内部进行纯化。并将其分为动力气和副产品气。因此,响应的残留产物从矫顽性输送单元被供应到残留产物纯化单元,而没有使管线流动。响应的残留产品处理器根据纯化后的副产物气体的流量选择合适的排气管,并防止响应的残留产品沿着流动的管道移动时流速的下降和功率的沉积。 2014年韩国知识产权局

著录项

  • 公开/公告号KR20140107758A

    专利类型

  • 公开/公告日2014-09-05

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20130021681

  • 发明设计人 CHIN KYOUNG HWANKR;

    申请日2013-02-28

  • 分类号H01L21/02;

  • 国家 KR

  • 入库时间 2022-08-21 15:42:11

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