首页> 外国专利> Method for manufacturing nanostructure using 2-dimensional transfer layer, nanostructure manufactured by the same and application device comprising the same

Method for manufacturing nanostructure using 2-dimensional transfer layer, nanostructure manufactured by the same and application device comprising the same

机译:使用二维转移层制造纳米结构的方法,由该二维转移层制造的纳米结构以及包括该纳米结构的施加装置

摘要

Provided is a method for manufacturing a nanostructure using a two-dimensional transfer layer. The method includes a step of laminating a two-dimensional transfer layer on a substrate, a step of laminating a molded film on the laminated two-dimensional transfer layer and manufacturing a nanomold by patterning the film, and a step of forming a nanostructure by laminating nanomaterials on the nanomold. [Reference numerals] (AA) Laminating two-dimensional sacrificing layer on a substrate;(BB) Laminating a molded film, and manufacturing a nanomold by patterning;(CC) Forming a nanostructure by laminating nanomaterials on the nanomold
机译:提供了一种使用二维转移层制造纳米结构的方法。该方法包括在基板上层压二维转移层的步骤,在层压的二维转移层上层压模制膜并通过将膜图案化来制造纳米模具的步骤以及通过层压来形成纳米结构的步骤。纳米材料上的纳米材料。 [附图标记](AA)在基板上层压二维牺牲层;(BB)层压模制膜,并通过构图制造纳米模具;(CC)通过在纳米模具上层压纳米材料形成纳米结构。

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