A MASK GLASS STAGE FOR EXPOSING, EXPOSING APPARATUS HAVING THE SAME AND EXPOSING METHOD USING THE SAME

摘要

Disclosed are a mask stage for exposure and an exposure apparatus and an exposure method using the same. The mask stage for exposure used in the disclosed exposure apparatus and the exposure method has: a first frame which is installed to be elevated by an operating part; a second frame which is supported to face the first frame; a support member which supports the second frame separated from the first frame; a mask glass which is installed to be supported by the second frame; and an elastic member which is elastically arranged between the first frame and the second frame. According to the configuration feature, the mask glass is controlled to perform soft contact on a substrate to be exposed through a primary movement stage in which the mask glass moves by the lowering of the mask stage and a secondary movement stage in which the mask glass secondarily moves at the mask stage by the expansion motion of the elastic member. According to the mask stage for exposure and the exposure apparatus and the exposure method using the same of the present invention, the soft contact motion of the mask glass on the exposure target substrate is capable of fundamentally excluding failure factors such as deformation, damage, or the like, improving exposure quality by maximizing the precision of close contact, increasing productivity due to simplicity and easiness of operation, and having economic efficiency and mass production through cost reduction.